The Interfaces Lab aims to understand and develop thin-film materials that can improve next-generation optoelectronic devices and integrated circuits.
Our focus lies on the dynamics of charge carriers in metal-dielectric and dielectric-semiconductor interfaces. Such interfaces are fundamental to the operation of most electronic devices, from simple diodes and solar cells, to complex 2D field effect transistors and memories. We explore a range of metal oxide and nitride functional dielectric materials, which can serve as a platform for tailoring and controlling semiconductor devices.
This young group was established in 2019 by Dr Ruy Sebastian Bonilla. It brings together the world-leading work in photovoltaics carried out by the Semiconductor and Silicon PV group, with a new research area on applied dielectric materials and interfaces. We're also happy to engage in new areas where semiconductor-dielectric interfaces can affect or limit device performance, so please drop us a line if you'd like to collaborate.