lab backg

In-House Facilities

  • Sinton photoconductance lifetime and SunsVoc measurement systems.
  • Deep-level transient spectroscopy (DLTS) set-up
  • 4 Source Measuring Units, Keithley and Agilent/Keysight
  • Boonton and Keysight Impedance spectroscopy meters
  • Anric Technologies AT410 Atomic Layer Deposition System
  • VacTechniche Thermal Evaporation System
  • Four-point probe rigs
  • Laser room with optical table
  • IR galvo scanned nanosecond laser (dicing and labelling)
  • UV galvo scanned nanosecond laser (doping and nanolayer ablation)
  • Fume cupboards for wet chemistry
  • Optical microscopes and digital imaging systems
  • KP020 Kelvin Probe instrument by KP Technology with surface photovoltage
  • Corona discharge apparatus
  • LOT Sun simulator ABA
  • Spectral reflectometer Filmetrics F20
  • Ellipsometer 4 wavelength FilmSense FS1
  • Ocean Optics Spectrophotometer and integrating sphere.
  • 2 Laurell spin coaters for thin film deposition.
  • Edwards 306 for thermal evaporation of metal contacts.
  • Specimen preparation laboratory, chemomechanical polishing

Modelling and Simulation Capabilities

  • TCAD Sentarus Device License
  • COMSOL multiphysics licences
  • Open Source simulation scripts in Matlab adn Python. Published via GITHUB.
  • Data Processing MATLAB scripts for IV, CV, LCR, Sinton, and Optical semiconductor characterisation.

Cleanroom Facilities

  • VacTechniche RF and DC reactive sputtering coater, 3 source.
  • Metal Deposition, Thermal Evaporator Eurocoater and the EBS-1800 e-beam deposition equipment.
  • Yellow Area (Photolithography), custom designed yellow area of 18 sq. meter area.
  • Quintel Q4000-6 Mask Aligner has three interchangeable substrate tools with a maximum substrate size of 6'' diameter.
  • RIE, Plasmalab 80+ Reactive Ion Etching
  • PECVD, PlasmaPro 80+ plasma enhanced chemical vapour deposition
  • Olympus BX51 reflective microscope with 5X, 10X, 20X, 50X, 100X objectives.
  • Rapid Thermal Annealing System, Jipelec Jetfirst Rapid Thermal Annealing Processor will process up to 4'' diameter
  • Oxidation and POCl furnaces

Shared Nanoscale Electron Microscopy Characterisation

  • Zeiss NVision 40 FIB-SEM witn Oxford Instruments Omniprobe micromanipulator, and Point Electronic EBIC system.
  • JEOL JSM 6500F scanning electron microscopes with cathodoluminescence, EBSD and EDX capabilities
  • FEI FIB200 focussed ion beam systems
  • JEOL ARM-200F transmission electron microscopes
  • LEAP™ 3000X HR, atom probe microscopes