Infrastructure

In-House Facilities

• Sinton photoconductance lifetime and SunsVoc measurement systems.
• Deep-level transient spectroscopy (DLTS) set-up
• 4 Source Measuring Units, Keithley and Agilent/Keysight
• Boonton and Keysight Impedance spectroscopy meters
• Anric Technologies AT410 Atomic Layer Deposition System
• VacTechniche Thermal Evaporation System
• Four-point probe rigs
• Laser room with optical table
• IR galvo scanned nanosecond laser (dicing and labelling)
• UV galvo scanned nanosecond laser (doping and nanolayer ablation)
• Fume cupboards for wet chemistry
• Optical microscopes and digital imaging systems
• KP020 Kelvin Probe instrument by KP Technology with surface photovoltage
• Corona discharge apparatus
• LOT Sun simulator ABA
• Spectral reflectometer Filmetrics F20
• Ellipsometer 4 wavelength FilmSense FS1
• Ocean Optics Spectrophotometer and integrating sphere.
• 2 Laurell spin coaters for thin film deposition.
• Edwards 306 for thermal evaporation of metal contacts.
• Specimen preparation laboratory, chemomechanical polishing

Modelling and Simulation Capabilities

• TCAD Sentarus Device License
• COMSOL multiphysics licences
• Open Source simulation scripts in Matlab adn Python. Published via GITHUB.
• Data Processing MATLAB scripts for IV, CV, LCR, Sinton, and Optical semiconductor characterisation.

Cleanroom Facilities

• VacTechniche RF and DC reactive sputtering coater, 3 source.
• Metal Deposition, Thermal Evaporator Eurocoater and the EBS-1800 e-beam deposition equipment.
• Yellow Area (Photolithography), custom designed yellow area of 18 sq. meter area.
• Quintel Q4000-6 Mask Aligner has three interchangeable substrate tools with a maximum substrate size of 6'' diameter.
• RIE, Plasmalab 80+ Reactive Ion Etching
• PECVD, PlasmaPro 80+ plasma enhanced chemical vapour deposition
• Olympus BX51 reflective microscope with 5X, 10X, 20X, 50X, 100X objectives.
• Rapid Thermal Annealing System, Jipelec Jetfirst Rapid Thermal Annealing Processor will process up to 4'' diameter
• Oxidation and POCl furnaces

Shared Nanoscale Electron Microscopy Characterisation

• Zeiss NVision 40 FIB-SEM witn Oxford Instruments Omniprobe micromanipulator, and Point Electronic EBIC system.
• JEOL JSM 6500F scanning electron microscopes with cathodoluminescence, EBSD and EDX capabilities
• FEI FIB200 focussed ion beam systems
• JEOL ARM-200F transmission electron microscopes
• LEAP™ 3000X HR, atom probe microscopes